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- W1978393623 abstract "Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to an atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created using optical standing waves while more complex light-fields might be created using computer generated optical elements to manipulate the laser beam." @default.
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- W1978393623 date "1999-10-01" @default.
- W1978393623 modified "2023-09-24" @default.
- W1978393623 title "<title>Micro-optical structures for atom lithography studies</title>" @default.
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- W1978393623 doi "https://doi.org/10.1117/12.364493" @default.
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