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- W1978447635 abstract "Abstract We present new developments of a novel surface smoothing method so-called gas cluster ion beam–chemical mechanical polishing (GCIB–CMP). This method employs GCIB with irradiation angles above 60° from the surface normal, and therefore can be applied to the smoothing of sidewalls of a patterned structure. Surface morphology is compared between various optical materials Si, SiO 2 and MgF 2 irradiated by SF 6 clusters. Si and SiO 2 surfaces are substantially smoothed at 0.3 nm and below in average roughness at incident angles around 80°. We estimate the expected performance improvement of Si and/or SiO 2 based photonic devices having smooth sidewall surfaces formed by the GCIB–CMP method." @default.
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- W1978447635 date "2005-12-01" @default.
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- W1978447635 title "Sidewall polishing with a gas cluster ion beam for photonic device applications" @default.
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- W1978447635 doi "https://doi.org/10.1016/j.nimb.2005.07.087" @default.
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