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• W1978602834 abstract "The interaction between ${mathrm{Er}}^{3+}$ and shallow impurities in Si nanocrystals (nc-Si) is studied for $mathrm{Si}{mathrm{O}}_{2}$ films containing Er and nc-Si $(mathrm{Er}:mathrm{nc}text{ensuremath{-}}mathrm{Si}:mathrm{Si}{mathrm{O}}_{2})$. The luminescence property of ${mathrm{Er}}^{3+}$ is strongly modified by shallow impurities in nc-Si. The formation of excess carriers in nc-Si by P or B doping results in the quenching of infrared photoluminescence (PL) of ${mathrm{Er}}^{3+}$ and the shortening of the lifetime. When P and B are doped simultaneously and carriers are compensated, the intensity and the lifetime are recovered. It is shown that the mechanism of the interaction is Auger de-excitation of excited ${mathrm{Er}}^{3+}$ with the interaction of electrons or holes in nc-Si. The estimated Auger coefficient is found to be two orders of magnitude smaller than that of Er doped bulk Si at low temperatures where carriers are bound to donor or acceptor ions, and four orders of magnitude smaller than that at room temperature. This small Auger coefficient makes nc-Si immune from the impurity Auger de-excitation process compared to Er doped bulk Si and is considered to be responsible for temperature independent efficient PL of $mathrm{Er}:mathrm{nc}text{ensuremath{-}}mathrm{Si}:mathrm{Si}{mathrm{O}}_{2}$ systems." @default.
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• W1978602834 date "2005-03-31" @default.
• W1978602834 modified "2023-09-23" @default.
• W1978602834 title "Interaction between Er ions and shallow impurities in Si nanocrystals within<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:mi mathvariant=normal>Si</mml:mi><mml:msub><mml:mi mathvariant=normal>O</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:mrow></mml:math>" @default.
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• W1978602834 doi "https://doi.org/10.1103/physrevb.71.115440" @default.
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