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- W1978632362 abstract "Subplantation of the noble-gas ions ${mathrm{He}}^{+}$, ${mathrm{Ne}}^{+}$, ${mathrm{Ar}}^{+}$, and ${mathrm{Kr}}^{+}$ into graphite in the energy range of 10--150 eV with doses in the range of 1--15ifmmodetimeselsetexttimesfi{}${10}^{14}$ ions/${mathrm{cm}}^{2}$ has been studied by Auger electron spectroscopy (AES) and computer simulations. A technique based on AES line-shape analysis has been employed to describe quantitatively the ion-induced damage to the lattice. The carbon KLL AES line shapes and the AES spectra from subplanted Ne, Ar, and Kr were used to determine the ion penetration thresholds ${mathit{E}}_{mathit{p}}$, ion displacement thresholds ${mathit{E}}_{mathrm{th}}$, and the lattice displacement energies ${mathit{E}}_{mathit{d}}$. The ${mathit{E}}_{mathit{p}}$'s scale linearly with the atomic radius of the projectiles. Defect production begins at ${mathit{E}}_{mathit{p}}$, although these energies are below ${mathit{E}}_{mathrm{th}}$. A mechanism for defect production at energies below ${mathit{E}}_{mathrm{th}}$ based on noble-gas interstitials and lattice strain and distortion is developed. This process is modeled through the charmm molecular modeling program and the trim classical trajectory simulation." @default.
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- W1978632362 date "1993-09-01" @default.
- W1978632362 modified "2023-10-14" @default.
- W1978632362 title "Near-threshold ion-induced defect production in graphite" @default.
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- W1978632362 doi "https://doi.org/10.1103/physrevb.48.6757" @default.
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