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- W1978691383 abstract "Laser ablation of Teflon doped with size-selected (30–250nm) Al nanoparticles is studied. Unlike pure Teflon, which requires a vacuum-ultraviolet or femtosecond excimer laser for ablation, this sensitized Teflon can be ablated with a near-infrared laser. Using 100ps duration pulses, near-infrared ablation thresholds are lower by about a factor of 10 from excimer ablation of pure Teflon. A mechanism is discussed that involves Teflon decomposition by spherical shock fronts originating at each irradiated nanoparticle. Studies of the distance dependence of this process as a function of particle diameter and oxide layer thickness suggest ways of optimizing the ablation process." @default.
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- W1978691383 date "2004-08-30" @default.
- W1978691383 modified "2023-10-16" @default.
- W1978691383 title "Near-infrared laser ablation of poly tetrafluoroethylene (Teflon) sensitized by nanoenergetic materials" @default.
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- W1978691383 doi "https://doi.org/10.1063/1.1785291" @default.
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