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- W1978706676 abstract "Plasma enhanced chemical vapor deposited a-Si:H/a-SIN x :H superlattices on silicon wafers were annealed by KrF excimer pulsed laser. Room temperature visible electroluminescence (EL) was successfully realized from these silicon-based superlattices structures with quite low threshold biased value 3.0V. It is a promising new way, in which all procedures are compatible with current silicon ULSI technology, to the realization of optoelectronic devices different from the porous silicon. Luminescent properties (including PL and EL) of samples with different laser annealing energy densities were compared and a preferred annealing condition was given." @default.
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- W1978706676 date "1998-01-12" @default.
- W1978706676 modified "2023-09-23" @default.
- W1978706676 title "Visible electroluminescence from pulsed-laser-annealed a-Si:H/a-SiN x :H superlattices on silicon wafer" @default.
- W1978706676 doi "https://doi.org/10.1117/12.298218" @default.
- W1978706676 hasPublicationYear "1998" @default.
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