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• W1978836476 startingPage "1484" @default.
• W1978836476 abstract "Microwave plasma enhanced chemical vapor deposition has been used to grow diamond films at substrate temperatures down to 435 °C using CO2/CH4 gas mixtures. An Arrhenius plot of growth rate as a function of substrate temperature yields a value for the activation energy for the growth step of 28 kJ mol−1. This is lower than that measured previously for CH4/H2 systems and hints at a different gas-surface chemistry when using CH4/CO2 plasmas. Molecular beam mass spectrometry has been used to measure simultaneously the concentrations of the dominant gas phase species present during growth, for a wide range of plasma gas mixtures (0%–80% CH4, balance CO2). The CHEMKIN computer package has also been used to simulate the experimental results in order to gain insight into the major reactions occurring within the microwave plasma. The calculated trends for all species agree well with the experimental observations. Using these data, the model for the gas phase chemistry can be reduced to only four overall reactions. Our findings suggest that CH3 radicals are likely to be the key growth species when using CO2/CH4 plasmas and provide a qualitative explanation for the narrow concentration window for diamond growth." @default.
• W1978836476 created "2016-06-24" @default.
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• W1978836476 date "2001-01-15" @default.
• W1978836476 modified "2023-10-16" @default.
• W1978836476 title "Low temperature diamond growth using CO2/CH4 plasmas: Molecular beam mass spectrometry and computer simulation investigations" @default.
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• W1978836476 doi "https://doi.org/10.1063/1.1333031" @default.
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