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- W1978889695 abstract "Growth of grains with sizes many times (>50×) larger than the film thickness and with uniform (111) texture, has been achieved in ultrathin (<100 nm) films of Si on SiO2. Growth of these secondary grains is driven by minimization of anisotropic surface energy. As a result, the secondary grain growth rate increases with decreasing film thickness. The time required for growth of large secondary grains decreases with increasing temperature." @default.
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- W1978889695 date "1984-03-15" @default.
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- W1978889695 title "Surface‐energy‐driven secondary grain growth in ultrathin (<100 nm) films of silicon" @default.
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- W1978889695 doi "https://doi.org/10.1063/1.94842" @default.
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