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- W1978960732 abstract "Low-temperature growth-rate activation energy E g for the growth of Si hydrides and the hydrogen desorption energy E d from Si surfaces are shown to differ from each other ( E g < E d ) as opposed to E g = E d , which has been frequently postulated. A comparative growth study of silane and disilane gas-source molecular beam epitaxy clarifies that this difference arises from non-negligible contributions from the adsorption kinetics in the formation of E g . Based on this knowledge, a method for determining the true E d values is presented, and its validity is demonstrated by a successful reduction to an identical E d value (2.0 eV), which was determined from much less, and mutually different E g values of silane and disilane growth." @default.
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- W1978960732 date "1997-06-01" @default.
- W1978960732 modified "2023-10-07" @default.
- W1978960732 title "Effects of Adsorption Kinetics on the Low-Temperature Growth-Rate Activation Energy in Si Gas-Source Molecular Beam Epitaxy" @default.
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- W1978960732 doi "https://doi.org/10.1143/jjap.36.l703" @default.
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