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- W1978992169 abstract "In this work, a monolithic integrated MEMS resonator was fabricated and tested. Surface micromachining method was employed to fabricate the cantilever MEMS resonator after a standard 3 μm CMOS process. The wet release method with dilute HF solution was chosen and compared to the anhydrous HF vapor release process. A release-monitoring structure with polysilicon/Au cantilever array was used to determine the corrosion time of the sacrificial material. Results showed that the MOSFETs function well after proposed release process." @default.
- W1978992169 created "2016-06-24" @default.
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- W1978992169 date "2013-06-01" @default.
- W1978992169 modified "2023-09-25" @default.
- W1978992169 title "Fabrication of monolithic integrated MEMS resonator with wet-release-monitoring array" @default.
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- W1978992169 doi "https://doi.org/10.1109/edssc.2013.6628207" @default.
- W1978992169 hasPublicationYear "2013" @default.
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