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- W1979112891 abstract "In situ doping characteristics of N, Al, and B in step-controlled epitaxy of SiC have been investigated. Clear C/Si ratio dependence was observed in the growth on (0001)Si faces. Doping efficiency of N decreased and those of Al and B increased under the C-rich condition, which agrees with a model proposed as ‘‘site-competition epitaxy.’’ However, doping efficiencies were almost independent of the C/Si ratio on (0001̄)C faces. Based on the results, the incorporation mechanism is discussed." @default.
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- W1979112891 date "1995-10-16" @default.
- W1979112891 modified "2023-10-09" @default.
- W1979112891 title "Incorporation mechanism of N, Al, and B impurities in chemical vapor deposition of SiC" @default.
- W1979112891 doi "https://doi.org/10.1063/1.114555" @default.
- W1979112891 hasPublicationYear "1995" @default.
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