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- W1979278325 abstract "Titanium dioxide thin films were formed by electron-beam evaporation onto fused silica substrates using serial bideposition (SBD). The SBD technique combines rapid substrate rotation and oblique-angle physical vapor deposition (PVD) to create optical coatings that are composed of nanostructured columns which exhibit large birefringence values in the plane of the substrate. In this study, post-deposition annealing was used to crystallize amorphous TiO<sub>2</sub> thin films formed by SBD to improve birefringence without significantly increasing optical absorption or scattering. Birefringent thin films were fabricated at deposition angles ranging from 60° to 75° and annealed in air at temperatures ranging from 200°C to 900°C to form anatase and rutile TiO<sub>2</sub>. Changes in the optical properties, crystallinity, and nanostructure were characterized by ellipsometry, x-ray diffraction, atomic force microscopy, and scanning electron microscopy. It was found that optical anisotropy increases strongly upon formation of anatase, yielding in-plane birefringence values that doubled from 0.11 to 0.22 in the case of TiO<sub>2</sub> thin films deposited at 60° and annealed at 400°C. Raising the annealing temperature to 900°C to form rutile thin films increased the thin film birefringence further but also led to low optical transparency due to increased absorption and diffuse scattering." @default.
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- W1979278325 date "2007-09-13" @default.
- W1979278325 modified "2023-09-23" @default.
- W1979278325 title "Thermal annealing of birefringent TiO 2 thin films formed by oblique-angle deposition" @default.
- W1979278325 doi "https://doi.org/10.1117/12.735425" @default.
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