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- W1979414062 abstract "The development of nano- and micropatterned materials is a key component of advanced nanotechnology. We report herein, a photo-based method for patterning general-purpose polymer films. Patterned ultraviolet (UV) light irradiation of a thin polystyrene film under controlled temperature generates surface relief structures by mass transfer from shaded to irradiated areas. The resulting surface relief structure can be arbitrarily erased by heating and reconstructed by patterned UV light irradiation, and this process is repeatable. This new method thus enables fabrication of dynamic reversible patterning structures from various general polymers. Our approach concerning a photo-based patterning for general purpose polymer films is described. Patterned UV light irradiation of a thin polystyrene film under controlled temperature generates surface relief structures by mass transfer from shaded to irradiated areas. The resulting surface relief structure can be arbitrarily erased by heating and reconstructed by patterned ultraviolet (UV) light irradiation, and this process is repeatable. This new method thus enables fabrication of dynamic reversible patterning structures from various general polymers." @default.
- W1979414062 created "2016-06-24" @default.
- W1979414062 creator A5038957855 @default.
- W1979414062 creator A5067900587 @default.
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- W1979414062 date "2012-03-28" @default.
- W1979414062 modified "2023-10-17" @default.
- W1979414062 title "Facile one-step photopatterning of polystyrene films" @default.
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- W1979414062 doi "https://doi.org/10.1038/pj.2012.40" @default.
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