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- W1979420129 abstract "Abstract AgCl thin films in a range of thicknesses from 0.05 to 2 μm were deposited by evaporation and r.f. sputtering of AgCl as well as by co-evaporation of AgCl and silver. Their structure and composition were studied using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy, energy-dispersive X-ray analysis and optical absorption spectroscopy. Films grown by evaporation show a preferential grain orientation that depends on the deposition rate. They are stoichiometric except for chlorine enrichment at the surface, but exposure to an electron beam or UV light causes metallic silver formation. AgCl films grown by r.f. sputter deposition have greater surface roughness than those grown by evaporation, a random grain orientation and a grain size that depends on the sputtering conditions. Metallic silver is present in these films. Optical absorption measurements of co-evaporated films suggest that the metallic silver occurs in two forms, small dispersed particles in the AgCl matrix and larger particles at the grain boudaries." @default.
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- W1979420129 date "1986-08-01" @default.
- W1979420129 modified "2023-09-26" @default.
- W1979420129 title "Compositional and morphological analysis of AgCl films deposited by evaporation and R.F. sputtering" @default.
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- W1979420129 doi "https://doi.org/10.1016/0040-6090(86)90307-x" @default.
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