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- W1979452547 abstract "Silicon-gold interfaces have been grown and exposed to electron beam irradiation under ultra high vacuu, conditions. The adhesion of the gold film is good when Au is evaporated on an atomically clean Si(111) surface. In contrast, the presence of a thin SiO2 native oxide between Au and Si decreases strongly the adhesion of the metallic layer. Electron irradiation of the clean SiAu interface provokes the agglomeration of the metallic layer. Direct determination of the sample temperature shows that thermal effects induced by the electron beam cannot be neglected." @default.
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- W1979452547 date "1986-04-01" @default.
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- W1979452547 title "Electron irradiation and adhesion at silicon-gold interfaces prepared under ultra high vacuum conditions" @default.
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- W1979452547 doi "https://doi.org/10.1016/0039-6028(86)90606-0" @default.
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