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- W1979535622 abstract "Boron diffusion during rapid thermal annealing performed with tungsten halogen lamps at temperatures between 1000 and 1200°C is investigated. 1 x 10 16 B + /cm 2 was implanted in (100) silicon crystals as well as in wafers predamaged or preamorphized by silicon implantation. Diffusion enhancement factors were determined by the comparison of experimental carrier profiles with computer simulations. An anomalous transient enhanced diffusion, more marked the lower the annealing temperature, has been found for all the investigated samples. This effect decreases from crystalline to predamaged and further to preamorphized substrates. Diffusion enhancement and electrical activation are discussed with respect to the residual defect structure detected by TEM investigations." @default.
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- W1979535622 date "1987-01-01" @default.
- W1979535622 modified "2023-10-01" @default.
- W1979535622 title "Comparison of boron diffusivity during rapid thermal annealing in predamaged, preamorphized and crystalline silicon" @default.
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- W1979535622 doi "https://doi.org/10.1016/s0168-583x(87)80102-7" @default.
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