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- W1979657705 abstract "Ultrathin (nominal thickness 0.4–2 Å) aluminum overlayers dramatically increase the oxidation rate of Ge(111) surfaces. The resulting chemisorption phase does not correspond to any of the known oxides of Ge or Al. This new phase is likely to provide a stable interface between Ge and GeO2." @default.
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- W1979657705 date "1982-04-01" @default.
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- W1979657705 title "Modification of the germanium oxidation process by aluminum adatoms" @default.
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- W1979657705 doi "https://doi.org/10.1063/1.93165" @default.
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