FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W1979793403> ?p ?o ?g. }

• W1979793403 endingPage "1721" @default.
• W1979793403 startingPage "1712" @default.
• W1979793403 abstract "The connection between the way of development and appearance of mesa structures and typical hillocks developing during anisotropic etching of monocrystalline silicon in 5 M KOH saturated with isopropanol has been studied both theoretically and experimentally. A simple geometrical model of mesa formation was presented. Then, the process of hillock growth in result of mesa transformation caused by etch mask underetching was analyzed. At the second part of the paper, the model of hillocks formation was verified experimentally. For this purpose, a series of experiments with etching of mini-mesas through the masks with various patterns in the conditions favoring hillock formation was carried out. It was shown that at the final stage of the etching process the mesas transform into hillocks, bounded by the planes close to {1 1 1}. Probably at the first stage of hillocks formation, mini-mesas develop. Such stable mini-mesas, produced in the presence of random micro-masks, may transform into typical hillocks in effect of successive releasing of {1 1 1} mini-faces. It seems that the process of hillock formation is similar to mesa etching. The shapes of hillocks produced on the substrates with different from (0 0 1) crystallographic orientations have been also analyzed. The similarities of the hillocks and intentionally prepared mesas were underlined. It was stated that the morphologies of hillocks are strictly connected with crystallographic orientation of etched substrate. Different shapes of hillocks developing on the substrates with different crystallographic orientations, reflect the arrangement and inclination of {1 1 1} planes on considered substrate." @default.
• W1979793403 created "2016-06-24" @default.
• W1979793403 creator A5004789840 @default.
• W1979793403 creator A5009644792 @default.
• W1979793403 date "2008-05-01" @default.
• W1979793403 modified "2023-09-26" @default.
• W1979793403 title "Development of etch hillocks on different Si(hkl) planes in silicon anisotropic etching" @default.
• W1979793403 cites W1639777823 @default.
• W1979793403 cites W1966215114 @default.
• W1979793403 cites W1975432346 @default.
• W1979793403 cites W1977081223 @default.
• W1979793403 cites W1985663466 @default.
• W1979793403 cites W1990356037 @default.
• W1979793403 cites W2010325570 @default.
• W1979793403 cites W2017731765 @default.
• W1979793403 cites W2028820707 @default.
• W1979793403 cites W2037534020 @default.
• W1979793403 cites W2041349421 @default.
• W1979793403 cites W2052403628 @default.
• W1979793403 cites W2082577228 @default.
• W1979793403 cites W2083545430 @default.
• W1979793403 cites W2086192170 @default.
• W1979793403 cites W2087836107 @default.
• W1979793403 cites W2089381400 @default.
• W1979793403 cites W2093786774 @default.
• W1979793403 cites W2105824617 @default.
• W1979793403 cites W2119612997 @default.
• W1979793403 cites W2125116839 @default.
• W1979793403 cites W2163905372 @default.
• W1979793403 doi "https://doi.org/10.1016/j.susc.2008.03.010" @default.
• W1979793403 hasPublicationYear "2008" @default.
• W1979793403 type Work @default.
• W1979793403 sameAs 1979793403 @default.
• W1979793403 citedByCount "21" @default.
• W1979793403 countsByYear W19797934032012 @default.
• W1979793403 countsByYear W19797934032013 @default.
• W1979793403 countsByYear W19797934032014 @default.
• W1979793403 countsByYear W19797934032015 @default.
• W1979793403 countsByYear W19797934032017 @default.
• W1979793403 countsByYear W19797934032019 @default.
• W1979793403 countsByYear W19797934032020 @default.
• W1979793403 countsByYear W19797934032021 @default.
• W1979793403 countsByYear W19797934032022 @default.
• W1979793403 crossrefType "journal-article" @default.
• W1979793403 hasAuthorship W1979793403A5004789840 @default.
• W1979793403 hasAuthorship W1979793403A5009644792 @default.
• W1979793403 hasConcept C100460472 @default.
• W1979793403 hasConcept C111368507 @default.
• W1979793403 hasConcept C120665830 @default.
• W1979793403 hasConcept C121332964 @default.
• W1979793403 hasConcept C127313418 @default.
• W1979793403 hasConcept C159985019 @default.
• W1979793403 hasConcept C171250308 @default.
• W1979793403 hasConcept C185592680 @default.
• W1979793403 hasConcept C192562407 @default.
• W1979793403 hasConcept C26953177 @default.
• W1979793403 hasConcept C2777289219 @default.
• W1979793403 hasConcept C2779227376 @default.
• W1979793403 hasConcept C49040817 @default.
• W1979793403 hasConcept C544956773 @default.
• W1979793403 hasConcept C6322943 @default.
• W1979793403 hasConcept C8010536 @default.
• W1979793403 hasConcept C85725439 @default.
• W1979793403 hasConceptScore W1979793403C100460472 @default.
• W1979793403 hasConceptScore W1979793403C111368507 @default.
• W1979793403 hasConceptScore W1979793403C120665830 @default.
• W1979793403 hasConceptScore W1979793403C121332964 @default.
• W1979793403 hasConceptScore W1979793403C127313418 @default.
• W1979793403 hasConceptScore W1979793403C159985019 @default.
• W1979793403 hasConceptScore W1979793403C171250308 @default.
• W1979793403 hasConceptScore W1979793403C185592680 @default.
• W1979793403 hasConceptScore W1979793403C192562407 @default.
• W1979793403 hasConceptScore W1979793403C26953177 @default.
• W1979793403 hasConceptScore W1979793403C2777289219 @default.
• W1979793403 hasConceptScore W1979793403C2779227376 @default.
• W1979793403 hasConceptScore W1979793403C49040817 @default.
• W1979793403 hasConceptScore W1979793403C544956773 @default.
• W1979793403 hasConceptScore W1979793403C6322943 @default.
• W1979793403 hasConceptScore W1979793403C8010536 @default.
• W1979793403 hasConceptScore W1979793403C85725439 @default.
• W1979793403 hasIssue "9" @default.
• W1979793403 hasLocation W19797934031 @default.
• W1979793403 hasOpenAccess W1979793403 @default.
• W1979793403 hasPrimaryLocation W19797934031 @default.
• W1979793403 hasRelatedWork W2001419347 @default.
• W1979793403 hasRelatedWork W2013557620 @default.
• W1979793403 hasRelatedWork W2029845838 @default.
• W1979793403 hasRelatedWork W2075175819 @default.
• W1979793403 hasRelatedWork W2091210967 @default.
• W1979793403 hasRelatedWork W2101974275 @default.
• W1979793403 hasRelatedWork W2240919621 @default.
• W1979793403 hasRelatedWork W2545291692 @default.
• W1979793403 hasRelatedWork W2889317882 @default.
• W1979793403 hasRelatedWork W3175464990 @default.
• W1979793403 hasVolume "602" @default.
• W1979793403 isParatext "false" @default.
• W1979793403 isRetracted "false" @default.
• W1979793403 magId "1979793403" @default.

• next