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• W1979982776 abstract "Abstract The phase composition of the surface layers in porous silicon (por-Si) is determined by analysis of the density of states in the valence band using ultrasoft X-ray emission spectroscopy (USXES) and X-ray photoelectron spectroscopy (XPS) of the core levels. Since porous silicon demonstrates instability of its properties the investigations of the changes in its phase composition under atmosphere exposure (e.g. low-temperature anneals in an oxygen flow) have been made. Phase analysis by USXES is performed with the help of a specially elaborated mathematical technique using expansion of the experimental spectrum by the spectra of some standard samples. c-Si and c-SiO2 as well as disordered phases of these species (by USXES) and low-oxidized defect silicon (by USXES and XPS) have been detected in the surface layers of por-Si. Some changes in the composition were found in the samples annealed in oxygen at various temperatures." @default.
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• W1979982776 date "2001-03-01" @default.
• W1979982776 modified "2023-10-02" @default.
• W1979982776 title "Determination of the phase composition of surface layers of porous silicon by ultrasoft X-ray spectroscopy and X-ray photoelectron spectroscopy techniques" @default.
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• W1979982776 doi "https://doi.org/10.1016/s0368-2048(00)00393-5" @default.
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