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• W1980073922 abstract "The diffusivity of iron in TiN films has been determined in samples prepared by reactive evaporation of Ti in N2 atmosphere on silicon substrates followed by evaporation of pure iron. The iron diffusion profiles have been investigated by 2 MeV 4He+ Rutherford backscattering spectroscopy (RBS) after annealing at temperatures up to 600°C. The diffusivity from 200°C to 600°C, D [m2/s] = 1.4 × 10−15 exp[−46/(RT)] is rather high when compared to the diffusivity of other atom species, as for example Si and Al, in TiN films." @default.
• W1980073922 created "2016-06-24" @default.
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• W1980073922 date "1995-01-01" @default.
• W1980073922 modified "2023-09-30" @default.
• W1980073922 title "Iron diffusion from pure Fe substrate into TiN buffer layers" @default.
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• W1980073922 doi "https://doi.org/10.1016/0921-4534(94)02360-3" @default.
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