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• W1980082335 abstract "We discuss characteristics variance in detail, caused by probing stress in 28 nm High-K and Metal Gate process. The Vth variation of nch large size transistor increases by 20% comparing with weak probing pressure (≃ 0). Regarding small size transistors, probing stress impact both on Vth fluctuation and on Tpd fluctuation is small. Moreover, we extracted the space distribution of probing stress quantitatively. It is useful to calibrate a stress simulation methodology and to facilitate evaluation of the mechanical strength of the material." @default.
• W1980082335 created "2016-06-24" @default.
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• W1980082335 date "2013-03-01" @default.
• W1980082335 modified "2023-09-26" @default.
• W1980082335 title "Tr variance evaluation induced by probing pressure and its stress extraction methodology in 28nm High-K and Metal Gate process" @default.
• W1980082335 cites W2120693500 @default.
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• W1980082335 doi "https://doi.org/10.1109/icmts.2013.6528172" @default.
• W1980082335 hasPublicationYear "2013" @default.
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