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- W1980366890 abstract "A pulsed laser deposition system with in situ laser annealing was utilized to grow Pb(Zr0.52Ti0.48)O3 thin films on a laser crystallized Pb(Zr0.20Ti0.80)O3 seed layer, at a temperature of ∼370 °C. Polycrystalline 1.1 μm thick films exhibited columnar grains with small grain sizes (∼30 nm). The films showed well-saturated hysteresis loops (with ∼25 μC/cm2 remanent polarization, ∼50 kV/cm coercive field) and exhibited loss tangents <2.5% with a permittivity of ∼730. Film orientation could be controlled via the substrate choice; {111} Pb(Zr0.52Ti0.48)O3 films were grown on oriented (111) Pb(Zr0.30Ti0.70)O3 sol-gel seed layers, while {001} films were prepared on (100) SrTiO3 single crystals." @default.
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- W1980366890 date "2013-07-15" @default.
- W1980366890 modified "2023-10-14" @default.
- W1980366890 title "<i>In situ</i> laser annealing during growth of Pb(Zr0.52Ti0.48)O3 thin films" @default.
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- W1980366890 doi "https://doi.org/10.1063/1.4816157" @default.
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