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- W1980910061 abstract "An illuminator with a micro scanning slit array for NA 0.75 lithography system has been proposed in this paper. In this illuminator, the beam is shaped by a diffractive optical element (DOE), a zoom and axicon lenses. The beam is homogenized by a micro intergrator rod array. The micro scanning slit array is used to substitute for the traditional internal rema. A micro lens array and a condenser image the micro scanning slit array onto the mask. This illuminator needs no illumination lens group and reduces the effect of the vibration introduced by the internal rema. The illuminator is designed and simulated. The result shows that the illuminating field on the mask has good uniformity and trapezoidal distribution along the scanning direction. The feasibility of the illuminator is verified." @default.
- W1980910061 created "2016-06-24" @default.
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- W1980910061 date "2013-04-12" @default.
- W1980910061 modified "2023-09-23" @default.
- W1980910061 title "Design and simulation of illuminator with micro scanning slit array for NA 0.75 lithography system" @default.
- W1980910061 doi "https://doi.org/10.1117/12.2011525" @default.
- W1980910061 hasPublicationYear "2013" @default.
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