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- W1981016368 abstract "CNx films have been deposited by reactive DC sputtering using an opposed-target Penning type magnetron geometry. Measurements over a range of conditions have shown that the amount of IR absorption due to the carbon-nitrogen bonds is not a good indicator of the nitrogen content of the films. Significant amounts of nitrogen are bound in IR-invisible structures, suggested to be N–N type bonds. The hardness and stress are shown not to be dependent on the total nitrogen concentration but only on the amount of CN present. The stress is also concentrated at the film-substrate interface whereas the bulk of the film is stress-free. The CN phase is eliminated by annealing at 600°C in vacuum. This treatment also reduces the concentration of the other carbon-nitrogen bonds and also weakens the structure; this result is confirmed by post-annealing hardness measurement." @default.
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- W1981016368 date "1997-10-01" @default.
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- W1981016368 title "The composition and bonding structure of CNx films and their influence on the mechanical properties" @default.
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- W1981016368 doi "https://doi.org/10.1016/s0040-6090(97)00381-7" @default.
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