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- W1981194051 abstract "Abstract This paper describes a low temperture scanning photoluminescence study to determine the spatial uniformity of the growth rates of undoped GaAs quantum wells sandwiched between Ga 0.7 A 1 0.3 As layers which were grown in a horizontal OMVPE reactor at atmospheric pressure. The observed spatial uniformity of the growth rates confirm Moffat and Jensen's predictions that under certain conditions bouyancy driven secondary flows can adversely effect the spatial uniformity of the growth rates in a horizontal organometallic vapour phase epitaxial reactor." @default.
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- W1981194051 date "1989-05-01" @default.
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- W1981194051 title "Scanning photoluminescence study of the spatial uniformity of the growth rates of OMVPE grown GaAs Quantum wells" @default.
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- W1981194051 doi "https://doi.org/10.1016/0022-0248(89)90279-0" @default.
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