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- W1981525030 abstract "In this paper, the influence of growth rate on the dopant confinement of silicon delta-doped GaAs epitaxial layers grown by low pressure metal organic vapor phase epitaxy (LP-MOVPE) was studied in detail. It was found that the growth rate influences the dopant confinement of Si delta-doped GaAs layers in the case of low silane flows. In contrast, at higher silane flows, growth rate has very little effect on the carrier confinement. The Si delta-doped GaAs layers with very good confinement and high sheet carrier concentration have been achieved under optimal conditions of LP-MOVPE." @default.
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- W1981525030 date "1993-11-19" @default.
- W1981525030 modified "2023-09-26" @default.
- W1981525030 title "Influence of growth rate on the dopant confinement in delta-doped GaAs epitaxial layers grown by low-pressure metal organic vapor phase epitaxy" @default.
- W1981525030 doi "https://doi.org/10.1117/12.162761" @default.
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