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- W1981655873 abstract "Abstract Hydrofluorinated amorphous silicon films have been deposited from pentafluorodisilane and 1,1,1-trifluorodisilane by chemical vapor deposition. The films and gaseous by-products of the depositions were analyzed by IR spectroscopy. The optical bandgap of the films ranged from 1.85 to 2.87 eV as determined from Tauc plots. The dark conductivity as a function of temperature was measured; room-temperature conductivities ranged from 10−13 to 10−10 S cm−1. The films demonstrated high photoconductivity under white light and a small Staebler-Wronski effect characterized by the t − 1 3 law." @default.
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- W1981655873 date "1989-10-01" @default.
- W1981655873 modified "2023-09-25" @default.
- W1981655873 title "Electrical and optical properties of amorphous silicon films deposited from fluorodisilanes" @default.
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- W1981655873 doi "https://doi.org/10.1016/0379-6787(89)90048-3" @default.
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