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- W1981753915 abstract "Hydrogenated polysilane films prepared from a SiH4 plasma were oxidized at room temperature and subsequently annealed at temperatures ranging from 800 to 1000 °C. It is found that the 1000 °C annealed films consist of Si nanocrystallites embedded in SiO2 and exhibit stable intense luminescence peaked at ∼1.5 eV under 488 nm excitation at room temperature. On the basis of the temperature and excitation power dependences of the steady-state and time-resolved luminescence from the annealed films, radiative recombination is thought to occur through localized states in the Si/SiO2 interface region. © 1997 Elsevier Science S.A." @default.
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- W1981753915 date "1997-04-01" @default.
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- W1981753915 title "Fabrication of silicon nanocrystallites by oxidation/annealing of polysilane films and their luminescence properties" @default.
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- W1981753915 doi "https://doi.org/10.1016/s0040-6090(96)09410-2" @default.
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