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- W1981799076 abstract "Evaporation of materials by means of lasers is a technique that has reached maturity as an optical coating and semiconductor epitaxial layer growth technology and as such has been applied to a large class of materials. Using cw and pulsed CO 2 lasers, several oxides, fluorides and semiconductors were deposited with good optical properties. Mixtures of the above were obtained by using multiple laser evaporation targets. The dielectric films were characterized for their optical properties and semiconductor films for their structural and electrical properties. Laser evaporation conditions and characterization results of the films will be explained." @default.
- W1981799076 created "2016-06-24" @default.
- W1981799076 creator A5061505722 @default.
- W1981799076 date "1984-06-14" @default.
- W1981799076 modified "2023-09-23" @default.
- W1981799076 title "Laser-Assisted Evaporations Of Dielectric And Semiconductor Materials" @default.
- W1981799076 doi "https://doi.org/10.1117/12.939439" @default.
- W1981799076 hasPublicationYear "1984" @default.
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