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• W1981966175 startingPage "S117" @default.
• W1981966175 abstract "Atomic-scale control and manipulation of the microstructure of polycrystalline thin films during kinetically limited low-temperature deposition, crucial for a broad range of industrial applications, has been a leading goal of materials science during the past decades. Here, we review the present understanding of film growth processes—nucleation, coalescence, competitive grain growth, and recrystallization—and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth." @default.
• W1981966175 created "2016-06-24" @default.
• W1981966175 creator A5008411200 @default.
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• W1981966175 date "2003-09-01" @default.
• W1981966175 modified "2023-10-16" @default.
• W1981966175 title "Microstructural evolution during film growth" @default.
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• W1981966175 doi "https://doi.org/10.1116/1.1601610" @default.
• W1981966175 hasPublicationYear "2003" @default.
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