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- W1982398980 abstract "Writing fogging effect in chemically amplified resist process makes critical effect on global CD distribution in the advanced 90nm node photomask with higher pattern density and smaller geometries. High contrast feature of chemically amplified resist makes difficult to correct the global CD uniformity in resist develop process compared with conventional ZEP resist. In this paper we examine the fogging effect in the combination chemically amplified resist with 50KeV writing tool and the consequential problem for production mask with higher pattern density. We will present the feasibility of the global CD uniformity correction technique in post exposure baking process using gradient temperature hotplate." @default.
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- W1982398980 date "2002-12-24" @default.
- W1982398980 modified "2023-09-27" @default.
- W1982398980 title "90nm Node CD Uniformity Improvement Using a Controlled Gradient Temperature CAR PEB Process" @default.
- W1982398980 doi "https://doi.org/10.1117/12.467905" @default.
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