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• W1984220369 abstract "Key physical phenomena associated with resists, illumination, lenses and masks are used to show the progress in models and algorithms for modeling optical projection printing as well as current simulation challenges in managing process complexity for manufacturing. The amazing current capability and challenges for projection printing are discussed using the 22 nm device generation. A fundamental foundation for modeling resist exposure, partial coherent imaging and defect printability is given. The technology innovations of resolution enhancement and chemically amplified resist systems and their modeling challenges are overviewed. Automated chip-level applications in pattern pre-compensation and design-anticipation of residual process variations require new simulation approaches." @default.
• W1984220369 created "2016-06-24" @default.
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• W1984220369 date "2010-06-01" @default.
• W1984220369 modified "2023-10-14" @default.
• W1984220369 title "Modeling Optical Lithography Physics" @default.
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• W1984220369 doi "https://doi.org/10.1143/jjap.49.06ga01" @default.
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