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- W1984767497 abstract "The optical dielectric functions for hafnium oxide and hafnium silicate films were extracted from spectroscopic ellipsometry measurements and the density then calculated using a previously proposed method. The values obtained were then compared to those obtained using X-ray reflectometry. The optical dielectric functions for gadolinium oxide films deposited under various conditions were also extracted from spectroscopic ellipsometry measurements. It was found using medium energy ion scattering that gadolinium oxide films deposited using Gd[N(SiCH3)2]3 and H2O as precursors, contained significant levels of silicon and the silicon concentration was directly proportional to the wafer deposition temperature. This effect was also observed in the density measurements extracted from spectroscopic ellipsometry data." @default.
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- W1984767497 date "2009-07-01" @default.
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- W1984767497 title "Estimate of dielectric density using spectroscopic ellipsometry" @default.
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- W1984767497 doi "https://doi.org/10.1016/j.mee.2009.03.027" @default.
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