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- W1985033513 abstract "Alternating phase shift mask (altPSM) as a strong resolution enhancement technique is increasingly required to meet the tighter lithographic requirements on gate critical dimension (CD) control, depth of focus and low k1 applications in full chip patterning of logic and memory devices. While the frequency doubling mechanism of altPSM benefits the quality of imaging, the inherent intensity asymmetry between phase shifters, or image imbalance, causes line shift. The effect of mask topography on electromagnetic wave propagation must be compensated in practice. Various designs of mask structure for correcting the intrinsic imaging asymmetry have been extensively studied. In this paper, we discuss several image imbalance correction methods for hidden phase edge altPSM architectures, including chrome undercut, shifter width sizing, sidewall chrome alternating aperture mask. We compared both hidden phase edge as well as exposed phase edge altPSM in terms of scalability, image correction effectiveness, and manufacturability for 90-nm, 65-nm technology nodes and beyond. Specifically, we define the altPSM architecture scalability in terms of three key components: 1. Mask manufacturability, design layout complexity, and effectiveness of image balance correction, 2. Mask patterning resolution, pattern fidelity, image placement, CD & overlay control at both chrome and glass levels, 3. Tightening quartz etch process control for given phase error tolerance. Applications of altPSM technology to line/space, hole, and phase shifted assisted features patterning with various altPSM architectures are also addressed." @default.
- W1985033513 created "2016-06-24" @default.
- W1985033513 creator A5005750337 @default.
- W1985033513 creator A5064380475 @default.
- W1985033513 creator A5077452318 @default.
- W1985033513 date "2003-08-26" @default.
- W1985033513 modified "2023-09-23" @default.
- W1985033513 title "Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond" @default.
- W1985033513 cites W1594489858 @default.
- W1985033513 doi "https://doi.org/10.1117/12.504391" @default.
- W1985033513 hasPublicationYear "2003" @default.
- W1985033513 type Work @default.
- W1985033513 sameAs 1985033513 @default.
- W1985033513 citedByCount "2" @default.
- W1985033513 crossrefType "proceedings-article" @default.
- W1985033513 hasAuthorship W1985033513A5005750337 @default.
- W1985033513 hasAuthorship W1985033513A5064380475 @default.
- W1985033513 hasAuthorship W1985033513A5077452318 @default.
- W1985033513 hasConcept C115961682 @default.
- W1985033513 hasConcept C119599485 @default.
- W1985033513 hasConcept C120665830 @default.
- W1985033513 hasConcept C121332964 @default.
- W1985033513 hasConcept C127413603 @default.
- W1985033513 hasConcept C154945302 @default.
- W1985033513 hasConcept C192562407 @default.
- W1985033513 hasConcept C204223013 @default.
- W1985033513 hasConcept C207789793 @default.
- W1985033513 hasConcept C24326235 @default.
- W1985033513 hasConcept C2780149590 @default.
- W1985033513 hasConcept C41008148 @default.
- W1985033513 hasConcept C48044578 @default.
- W1985033513 hasConcept C49040817 @default.
- W1985033513 hasConcept C55020928 @default.
- W1985033513 hasConcept C62064638 @default.
- W1985033513 hasConcept C76155785 @default.
- W1985033513 hasConcept C77088390 @default.
- W1985033513 hasConcept C78371743 @default.
- W1985033513 hasConceptScore W1985033513C115961682 @default.
- W1985033513 hasConceptScore W1985033513C119599485 @default.
- W1985033513 hasConceptScore W1985033513C120665830 @default.
- W1985033513 hasConceptScore W1985033513C121332964 @default.
- W1985033513 hasConceptScore W1985033513C127413603 @default.
- W1985033513 hasConceptScore W1985033513C154945302 @default.
- W1985033513 hasConceptScore W1985033513C192562407 @default.
- W1985033513 hasConceptScore W1985033513C204223013 @default.
- W1985033513 hasConceptScore W1985033513C207789793 @default.
- W1985033513 hasConceptScore W1985033513C24326235 @default.
- W1985033513 hasConceptScore W1985033513C2780149590 @default.
- W1985033513 hasConceptScore W1985033513C41008148 @default.
- W1985033513 hasConceptScore W1985033513C48044578 @default.
- W1985033513 hasConceptScore W1985033513C49040817 @default.
- W1985033513 hasConceptScore W1985033513C55020928 @default.
- W1985033513 hasConceptScore W1985033513C62064638 @default.
- W1985033513 hasConceptScore W1985033513C76155785 @default.
- W1985033513 hasConceptScore W1985033513C77088390 @default.
- W1985033513 hasConceptScore W1985033513C78371743 @default.
- W1985033513 hasLocation W19850335131 @default.
- W1985033513 hasOpenAccess W1985033513 @default.
- W1985033513 hasPrimaryLocation W19850335131 @default.
- W1985033513 hasRelatedWork W1931823040 @default.
- W1985033513 hasRelatedWork W1969331122 @default.
- W1985033513 hasRelatedWork W1987855151 @default.
- W1985033513 hasRelatedWork W2001149436 @default.
- W1985033513 hasRelatedWork W2068273844 @default.
- W1985033513 hasRelatedWork W2068486091 @default.
- W1985033513 hasRelatedWork W2068691156 @default.
- W1985033513 hasRelatedWork W2077203087 @default.
- W1985033513 hasRelatedWork W3112693398 @default.
- W1985033513 hasRelatedWork W3143665566 @default.
- W1985033513 isParatext "false" @default.
- W1985033513 isRetracted "false" @default.
- W1985033513 magId "1985033513" @default.
- W1985033513 workType "article" @default.