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- W1985484838 abstract "Electrochemically etched porous silicon (PSi) is formed and employed as a substrate for the entrapment of oligonucleotides and the subsequent development of stable DNA biosensors. The controlled potential anodic etching of p-type silicon wafers is optimized in order to obtain a surface layer with pore diameters which are close to those of the adsorbed DNA helix. The stabilization and hybridization of DNA inside the PSi layer is confirmed using ATR-FTIR. Moreover hybridization is verified by the large and reproducible impedance changes at the interface layer. The developed PSi DNA sensor paves the way for the label-free detection of oligonucleotide sequences in DNA microarrays and microfabricated PSi field-effect sensors." @default.
- W1985484838 created "2016-06-24" @default.
- W1985484838 creator A5006445802 @default.
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- W1985484838 date "2008-09-01" @default.
- W1985484838 modified "2023-10-16" @default.
- W1985484838 title "DNA Stabilization and Hybridization Detection on Porous Silicon Surface by EIS and Total Reflection FT-IR Spectroscopy" @default.
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- W1985484838 doi "https://doi.org/10.1002/elan.200804268" @default.
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