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- W1985681337 abstract "Diffractive mask-aligner lithography is capable to print structures that have a sub-500-nanometer resolution by using non-contact mode. This requires the use of specially designed phase-masks and dedicated illumination conditions in the Mask-Aligner to obtain the optimal exposure conditions, a spectral filter and a polarizer needs to be placed in the beam path. We introduce here mask designs that includes a polarizer on the top side of a photo-mask and a diffractive element on the bottom one. This enables printing of high resolution structures of arbitrary orientation by using a classical mask-aligner in proximity exposure mode." @default.
- W1985681337 created "2016-06-24" @default.
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- W1985681337 date "2015-03-18" @default.
- W1985681337 modified "2023-09-23" @default.
- W1985681337 title "Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography" @default.
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- W1985681337 doi "https://doi.org/10.1117/12.2085777" @default.
- W1985681337 hasPublicationYear "2015" @default.
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