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- W1986397803 abstract "Double injection currents are measured in p-type silicon with plane parallel metal-semiconductor-metal structure and found to contain an ohmic portion followed by a region in which J ∝ V3 / d5. The experimental values of the transition voltage agree well with the results obtained by the calculation using Lampert's theory. In p-Typ Silizium, mit plan-paralleler Metall-Halbleiter-Metall Struktur wurden Doppel-Injektions Ströme gemessen. Es wurde gefunden, dass sie einen ohm'schen Anteil haben, der von einer Zone gefolgt wird, in welcher J ∝ V3/d5. Der experimentelle Wert dieser Übergangsspannung stimmt gut mit den Resultaten uberein, die nach Lamperts Theorie berechnet wurden." @default.
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- W1986397803 date "1967-06-01" @default.
- W1986397803 modified "2023-10-16" @default.
- W1986397803 title "Dependence of double injection currents on both voltage and sample thickness in p-type silicon" @default.
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- W1986397803 doi "https://doi.org/10.1016/0038-1098(67)90597-2" @default.
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