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- W1986558605 abstract "Aluminum films were deposited in high vacuum (10−8 Torr) onto the (100) [also designated (200)] faces of cleaved NaCl signal-crystal substrates. The effect of changes in rate of deposition, in the conditions of substrate cleavage (air and vacuum), in substrate temperature, and in film thickness on the orientation of the films were investigated. In general with a film thickness of 400−500 Å, an optimum substrate temperature of 350 °C resulted in polycrystalline Al films with a (100) orientation. The orientation was most pronounced when the NaCl substrates were cleaved in vacuum and the deposition rate was less than 1 Å sec−1, or when the substrates were cleaved in air and the deposition rate was greater than 10 Å sec−1. Single-crystal films with a (100) orientation were obtained when the film thickness was limited to about 100 Å." @default.
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- W1986558605 date "1975-08-01" @default.
- W1986558605 modified "2023-09-27" @default.
- W1986558605 title "Effect of deposition rate and substrate cleavage on epitaxial Al films" @default.
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- W1986558605 doi "https://doi.org/10.1063/1.322050" @default.
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