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- W1986736776 abstract "The trapping and release of inert gases during the low energy ion bombardment in PVK (poly-N-vinylcarbazole) were studied using the statical method of secondary ion mass spectrometry (s SIMS). Measurements were performed in ultra-high vacuum conditions. Primary ion beams were mass separated. The deposition of He, Ne, Ar, Kr and Xe ions with the energies in the range from 0.5-4.0 keV were investigated. The strong dependence of the deposition rate on kind of ions was observed. The maximum deposition was found for argon ions. The proposed structural mechanism of deposition was confirmed by the temperature dependence of deposition rate. The inert gas atoms were found totally removed from the sample at the glass point temperature of PVK. The model of inert gas deposition taking into consideration the helical structure of the PVK chain is presented." @default.
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- W1986736776 date "1984-01-01" @default.
- W1986736776 modified "2023-09-23" @default.
- W1986736776 title "The deposition of inert gas ions in poly-N-vinylcarbazole (PVK)" @default.
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- W1986736776 doi "https://doi.org/10.1016/0042-207x(84)90151-9" @default.
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