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- W1986944266 abstract "Low energy ion implantation (2–10 keV) of beryllium has been performed and annealing carried out by rapid thermal annealing at different temperatures. Secondary ion mass spectrometry measurements of implanted profiles showed a strong diffusion of the beryllium atoms towards the surface. For the lowest implantation energies this influence is so strong that no indiffusion could be measured. The resulting annealed profile is much narrower than the implanted profile. From diodes fabricated from these layers, a barrier enhancement of 0.42 eV has been determined." @default.
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- W1986944266 date "1988-01-01" @default.
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- W1986944266 title "Annealing behaviour of extremely low energy beryllium implantation into Ga0.47In0.53As" @default.
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- W1986944266 doi "https://doi.org/10.1016/0040-6090(88)90317-3" @default.
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