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Matches in SemOpenAlex for { <https://semopenalex.org/work/W1987033728> ?p ?o ?g. }

• W1987033728 endingPage "C271" @default.
• W1987033728 startingPage "C271" @default.
• W1987033728 abstract "A novel atomic layer deposition process for the preparation of fluoride thin films in a temperature range of 225 °C-400 °C is introduced. The crystallinity, morphology, composition, thicknesses, refractive indices, and transmittance of the films are analyzed. Low impurity levels are obtained at 350 °C-400 °C with good stoichiometry. Refractive indices of 1.34-1.42 for MgF2, 1.43 for CaF2, and 1.57-1.61 for LaF3 films are obtained." @default.
• W1987033728 created "2016-06-24" @default.
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• W1987033728 date "2008-02-14" @default.
• W1987033728 modified "2023-09-28" @default.
• W1987033728 title "Atomic layer deposition process with TiF_4 as a precursor for depositing metal fluoride thin films" @default.
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• W1987033728 doi "https://doi.org/10.1364/ao.47.00c271" @default.
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