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• W1987355969 abstract "Amorphous CNx thin films with 0.7 ≤x ≤ 1.1 were obtained by ArF excimer laser chemical vapor deposition from NH3 and CCl4 as precursors in the substrate temperature range of 200 to 400 °C. The slightly brownish films are optically transparent and electrically insulating. They are mechanically stable (several mm free standing at about 100 nm thickness) and very smooth (0.3 nm r.m.s. roughness). They are insoluble in organic solvents, in lyes and in acids except for concentrated sulfuric acid. They are heat resistant up to 600 °C but decompose completely at 800 °C." @default.
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• W1987355969 date "1997-04-01" @default.
• W1987355969 modified "2023-09-26" @default.
• W1987355969 title "CNx thin films prepared by laser chemical vapor deposition" @default.
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• W1987355969 doi "https://doi.org/10.1016/s0921-5107(96)01938-1" @default.
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