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- W1987482016 abstract "컴퓨터비전에서 안정적으로 대응점을 획득하는 것은 매우 중요한 일이다. 그러나 이들은 스케일, 조명, 시점 등이 변하는 환경에서 정확한 대응점을 찾는 과정은 쉽지 않다. SIFT 알고리즘은 객체의 모서리나 꼭지점으로부터 추출한 특징벡터를 사용하므로 스케일링, 회전, 조명변화를 가지는 영상에서도 뛰어난 매칭을 수행한다. 그러나 SIFT는 엣지에 의해 특징점을 추출하므로 엣지가 존재하지 않는 영역에서는 원하는 대응점을 찾을 수 없다. 본 연구는 SIFT에 의한 대응 특징점 추출과 매칭 성능을 향상시키기 위한 마커 모양 및 배치 방법을 제안한다. 제안 방법에서 사용한 마커의 모양은 부착 방향에 따라 SIFT 알고리즘에 의해 한 방향으로 우세한 벡터를 검출할 수 있는 반원형(SemiCircle)으로 구성한다. 그리고 대응점 매칭의 성능을 향상시키기 위하여 마커의 방향 배치는 드 브루인 수열(De Bruijn Sequence)을 이용한다. 실험을 통해 제안한 방법이 기존의 방법보다 더 정확한 특징점 검출과 매칭에 효과적임을 증명하였다. In computer vision, it is very important to obtain reliable corresponding feature points. However, we know it is not easy to find the corresponding feature points exactly considering by scaling, lighting, viewpoints, etc. Lots of SIFT methods applies the invariant to image scale and rotation and change in illumination, which is due to the feature vector extracted from corners or edges of object. However, SIFT could not find feature points, if edges do not exist in the area when we extract feature points along edges. In this paper, we present a new placement method of marker to improve the performance of SIFT feature detection and matching between different view of an object or scene. The shape of the markers used in the proposed method is formed in a semicircle to detect dominant direction vector by SIFT algorithm depending on direction placement of marker. We applied De Bruijn sequence for the markers direction placement to improve the matching performance. The experimental results show that the proposed method is more accurate and effective comparing to the current method." @default.
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- W1987482016 date "2012-06-28" @default.
- W1987482016 modified "2023-10-17" @default.
- W1987482016 title "Effective Marker Placement Method By De Bruijn Sequence for Corresponding Points Matching" @default.
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- W1987482016 doi "https://doi.org/10.5392/jkca.2012.12.06.009" @default.
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