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• W1987554059 abstract "Boron ions (2 MeV) were implanted into type IIa natural diamond samples to create deep buried conducting layers. The implantation was carried out at room temperature, followed by furnace annealing at temperatures up to 1650 °C. Data of Hall effect and conductivity measurements are presented in a wide temperature range, which clearly show p-type conduction with an activation of up to 30% of the implanted boron atoms, which is the highest value yet reported for ion implanted diamond." @default.
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• W1987554059 date "2004-10-01" @default.
• W1987554059 modified "2023-10-10" @default.
• W1987554059 title "Highly effective p-type doping of diamond by MeV-ion implantation of boron" @default.
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• W1987554059 doi "https://doi.org/10.1016/j.diamond.2004.04.005" @default.
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