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- W1987758963 abstract "We have developed a new technique to fabricate antireflection surface using silicon nano-tips for use on a micro sun sensor for Mars rovers. We have achieved randomly distributed nano-tips of radius spanning from 20 nm to 100 nm and aspect ratio of ∼200 using a two-step dry etching process. The 30° specular reflectance at the target wavelength of 1 μm is only about 0.09 %, nearly three orders of magnitude lower than that of bare silicon, and the hemispherical reflectance is ∼8%. By changing the density and aspect ratio of these nanotips, the change in reflectance is demonstrated. Using surfaces covered with these nano-tips, the critical problem of ghost images that are caused by multiple internal reflections in a micro sun sensor was solved." @default.
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- W1987758963 date "2006-01-01" @default.
- W1987758963 modified "2023-10-03" @default.
- W1987758963 title "Silicon Nanotips Antireflection Surface for Micro Sun Sensor" @default.
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- W1987758963 doi "https://doi.org/10.1109/nano.2006.247704" @default.
- W1987758963 hasPublicationYear "2006" @default.
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