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- W1987774754 abstract "We determined the annealing dynamics of As<sub>Ga</sub> antisite defects in As ion-implanted GaAs based on a model where As<sub>Ga</sub> antisite defects trap photo-excited carriers. An Arrhenius plot of the carrier decay rate vs. annealing temperature in the high temperature regime gave an energy <i>E</i><sub>PA</sub>, which was different from true activation energy. The annealing time dependence of <i>E</i><sub>PA</sub> obtained by the two diffusion models (self diffusion and V<sub>Ga</sub> vacancy assisted diffusion of defects) were compared with <i>E</i><sub>PA</sub>'s obtained form already published works, which proved that the density of V<sub>Ga</sub> vacancy was high enough to assist the diffusion of As<sub>Ga</sub> antisite defects and that the annealing dynamics of As<sub>Ga</sub> antisite defects was V<sub>Ga</sub> vacancy assisted diffusion." @default.
- W1987774754 created "2016-06-24" @default.
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- W1987774754 date "2005-12-05" @default.
- W1987774754 modified "2023-09-23" @default.
- W1987774754 title "Annealing dynamics of As ion-implanted GaAs: As Ga antisite defect model" @default.
- W1987774754 doi "https://doi.org/10.1117/12.647725" @default.
- W1987774754 hasPublicationYear "2005" @default.
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