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- W1987791760 abstract "An indium–tin oxide (ITO) surface was treated with oxygen (O 2 ) plasma in a triode glow discharge system. The processing time and the radio frequency (rf) voltage applied to the substrate electrode were changed. The contact angle, X-ray photoelectron spectroscopy (XPS) spectra and scanning electron microscopy (SEM) image of the O 2 -plasma-treated ITO surface, and the characteristics of organic electroluminescence (EL) devices fabricated on O 2 -plasma-treated ITO were investigated. By applying an rf voltage of 200 V, contact angle decreased from 35 to 11°, the concentration ratio of C 1s/In 3d decreased, that of O 1s/In 3d increased, and the operating voltage of the EL devices decreased." @default.
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- W1987791760 date "2006-10-01" @default.
- W1987791760 modified "2023-09-25" @default.
- W1987791760 title "Oxygen-Plasma Treatment of Indium–Tin Oxide in a Triode Glow Discharge" @default.
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- W1987791760 doi "https://doi.org/10.1143/jjap.45.8517" @default.
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