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- W1987802054 abstract "High-performance indium arsenic (InAs) channel-based quantum well field-effect transistors (QWFETs) have been fabricated. A superior drain–source current density of 1015 mA/mm was achieved, with a high transconductance of 1900 mS/mm when the drain was biased at 0.5 V. The current gain cutoff frequency and maximum oscillation frequency were extracted to be 393 and 260 GHz, respectively. A very low gate delay of 0.54 ps was also achieved at a 0.5 V drain bias. Compared to a silicon n-channel metal-oxide semiconductor field-effect transistor, the QWFETs exhibited a better radio-frequency performance with lower dc power consumption, which indicates the great potential for high-speed and low-voltage digital applications." @default.
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- W1987802054 date "2008-01-01" @default.
- W1987802054 modified "2023-10-16" @default.
- W1987802054 title "InAs Channel-Based Quantum Well Transistors for High-Speed and Low-Voltage Digital Applications" @default.
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- W1987802054 doi "https://doi.org/10.1149/1.2917808" @default.
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