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- W1988003819 abstract "Differential thermal analysis is applied to the measurement of defect total energies in GaAs. First, the technique is used to determine the energy liberated in the recombination of an As vacancy-interstitial pair; the result, in agreement with the theoretical estimate of the energy stored in such defect, allows the demonstration of the validity of the technique as well as its limitations. Then, the technique is used to evaluate the introduction rate of such defects by electron irradiation in a semi-insulating material in which electrical techniques cannot be applied. Finally, a characterization of native defects is attempted; it shows that recombination of native vacancies, with interstitials liberated when the movement of α dislocations takes place, occurs around 450 °C." @default.
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- W1988003819 date "1987-10-01" @default.
- W1988003819 modified "2023-09-27" @default.
- W1988003819 title "Study of defects in GaAs by differential thermal analysis" @default.
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- W1988003819 doi "https://doi.org/10.1063/1.339847" @default.
- W1988003819 hasPublicationYear "1987" @default.
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