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- W1988258929 abstract "In this study, we report that the p-type GaN (p-GaN) capping layer grown on top of p-type AlGaN (p-AlGaN) and the fabrication of recessed channels are used to demonstrate a new type of nonalloyed ohmic contact. Because the p-GaN layer grown on p-AlGaN led to the formation of spontaneous polarization fields in p-GaN and the lower band bending of p-AlGaN resulting in the formation of a two-dimensional hole gas (2DHG). As a result, we deduce that holes can be easily injected into the p-AlGaN layer through recessed channels and a 2DHG channel, which results in nonalloyed ohmic formation." @default.
- W1988258929 created "2016-06-24" @default.
- W1988258929 creator A5006138701 @default.
- W1988258929 date "2006-01-13" @default.
- W1988258929 modified "2023-10-14" @default.
- W1988258929 title "Nonalloyed Ohmic Formation for p-Type AlGaN with p-Type GaN Capping Layers Using Ohmic Recessed Technique" @default.
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- W1988258929 doi "https://doi.org/10.1143/jjap.45.l86" @default.
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